JPH03115663U - - Google Patents

Info

Publication number
JPH03115663U
JPH03115663U JP2303190U JP2303190U JPH03115663U JP H03115663 U JPH03115663 U JP H03115663U JP 2303190 U JP2303190 U JP 2303190U JP 2303190 U JP2303190 U JP 2303190U JP H03115663 U JPH03115663 U JP H03115663U
Authority
JP
Japan
Prior art keywords
mass flow
flow controller
thin film
forming
cvd apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2303190U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP2303190U priority Critical patent/JPH03115663U/ja
Publication of JPH03115663U publication Critical patent/JPH03115663U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
JP2303190U 1990-03-07 1990-03-07 Pending JPH03115663U (en])

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2303190U JPH03115663U (en]) 1990-03-07 1990-03-07

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2303190U JPH03115663U (en]) 1990-03-07 1990-03-07

Publications (1)

Publication Number Publication Date
JPH03115663U true JPH03115663U (en]) 1991-11-29

Family

ID=31526033

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2303190U Pending JPH03115663U (en]) 1990-03-07 1990-03-07

Country Status (1)

Country Link
JP (1) JPH03115663U (en])

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022208621A1 (ja) * 2021-03-29 2022-10-06 株式会社日立ハイテク ガス供給制御装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022208621A1 (ja) * 2021-03-29 2022-10-06 株式会社日立ハイテク ガス供給制御装置
JPWO2022208621A1 (en]) * 2021-03-29 2022-10-06

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